Effect of Voltage Biased Plate on Magnetized Plasma Distribution and Flow

Applying a voltage on the rectangular metal plate in RF produced plasma, two-dimensional profiles of ion saturation current, transverse plasma flow and floating potential were measured, changing a filling pressure, magnetic field and applied voltage. It was found that near the plate surface, plasma density was lower and the spatial inhomogeneity of shifted profile was enhanced, which was consistent with the Mach probe measurement and E × B direction (E: electrostatic field, B: magnetic field).