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Control of Electron Density and Rotation Profiles by Voltage Biased Electrodes in RF Produced Plasma

S. Shinohara, N. Matsuoka, S. Matsuyama

Fusion Science and Technology / Volume 39 / Number 1T / January 2001 / Pages 358-361

Poster Presentations / dx.doi.org/10.13182/FST01-A11963480

Published:February 8, 2018

Using voltage biasing to ten concentric rings, profiles of plasma density and high azimuthal rotation velocity in a supersonic regime were controlled under three magnetic field configurations in a cylindrical magnetized RF produced plasma. Low frequency (< 4 kHz) density oscillation was identified as a drift wave type: propagation in the electron diamagnetic direction, which is opposite to the edge plasma rotation.