Effects of the Surface Floating Potential on Sputtering, Backscattering, and Implantation by Fusion Plasma Ions

C. A. Ordonez; R. Carrera; W. D. Booth; M. E. Oakes

doi:dx.doi.org/10.13182/FST91-A29595

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Effects of the Surface Floating Potential on Sputtering, Backscattering, and Implantation by Fusion Plasma Ions

C. A. Ordonez, R. Carrera, W. D. Booth, M. E. Oakes

Fusion Science and Technology / Volume 19 / Number 3P2B / May 1991 / Pages 1750-1754

Impurity Control and Plasma-Facing Component / Proceedings of the Ninth Topical Meeting on the Technology of Fusion Energy (Oak Brook, Illinois, October 7-11, 1990) / dx.doi.org/10.13182/FST91-A29595

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A Monte Carlo program for simulating plasma ions incident on a surface with a floating potential is presented. This program is used for calculating sputtering, backscattering, and implantation values for deuterium plasma ions incident on a carbon surface. Sputtering, backscattering, and implantation by accelerated Maxwellian, monoenergetic, and Maxwellian ions are compared at the same average incident energy. Values for accelerated Maxwellian ions are found to be significantly different from values for monoenergetic and Maxwellian ions.