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Depth Profiling of Tritium in Materials for Fusion Technology

J.A. SAWICKI

Fusion Science and Technology / Volume 14 / Number 2P2A / September 1988 / Pages 884-889

Tritium Properties and Interactions with Material / Proceedings of the Third Topical Meeting on Tritium Technology in Fission, Fusion and Isotopic Applications (Toronto, Ontario, Canada, May 1-6, 1988) / dx.doi.org/10.13182/FST88-A25246

The paper outlines recent progress in depth profiling of tritium distribution near the surface of materials by two ion beam techniques; elastic recoil detection (ERD) and T(d,α)n nuclear reaction analysis (NRA). The sensitivity and depth-resolution of both methods are examined for a series of tritiated titanium films. Calculated depth profiles and ranges of implanted tritium ions in selected candidate materials for thermonuclear fusion devices are also given. Depth profiles of tritium implanted into specimens of graphite and lithium oxides as a function of temperature are discussed as the examples of applications.